Product Specifications
Product Description
The DC bias power supply is commonly used in electrical arc ion plating, DC magnetron sputtering, magnetron sputtering ion plating, unbalanced magnetron sputtering, and twin magnetron sputtering systems for substrate bias during film deposition.
The main features of these power inverters include: Glow discharge substrate surface cleaning, ion bombardment during thin film deposition, substrate surface temperature control and so on. Using proper biasing parameters, one not only can avoid surface arcing to increase products yield but also can enhance surface smoothness and thin film/substrate adhesion.
Plasma Technology Limited was established in 1998 with seed money from the Hong Kong Industry Department. The mission of the company is to design and manufacture plasma-based equipment for research and commercial uses.
The company also provides consultation on materials processing and characterization, equipment design, as well as plasma, vacuum, and deposition technologies to the coatings, semiconductors, materials, critical components, biotechnology, and other industries worldwide.
In 2004, Plasma Technology Limited has awarded the 2004 Hong Kong Awards for Industry - Technological Achievement Certificate of Merit.
