(CNM could provide high quality target material for the field of electrical and semiconductor devices, flat panel display, architectural and automotive glass, thin film solar cell, magnetic storage, instrument, decorate thin film, etc. )
High purity metal sputtering target material (3N-6N):
Aluminum target(Al), chromium target(Cr), copper target(Cu), nickel target(Ni), silicon target(Si), germanium target(Ge), niobium target(Nb), titanium target(Ti), indium target(In), silver target(AG), tin target(Sn), graphite target, tantalum target(Ta), molybdenum target(Mo), gold target(Au), hafnium target(Hf), manganese target(Mn), zirconium target(Zr), magnesium target(Mg), zinc target(Zn), lead target(Pb), iridium target(IR), yttrium target(Y), cerium target(CE), lanthanum target(La), ytterbium target(Yb), gadolinium target(Gd), platinum target(PT), etc.
High density ceramic target (3N-5N):
ITO target, AZO target, IGZO target, magnesium oxide target(MGO), yttrium oxide target(Y2O3), iron oxide target(Fe2O3), nickel oxide target(Ni2O3), chromium oxide target(Cr2O3), zinc oxide target(ZnO), zinc sulfide target(ZnS), cadmium sulfide target(CDS), molybdenum disulfide target(MOS2), silicon dioxide target(SiO2), silicon monoxide target(SiO), zirconium dioxide target(ZrO2), niobium pentoxide target(Nb2O5), titanium dioxide(TiO2), hafnium oxide target(HfO2), titanium boride target(TiB2), zirconium diboride target(ZrB2), tungstic oxide target(WO3), aluminum oxide target(Al2O3), tantalum pentoxide target(Ta2O5), magnesium fluoride target(MgF2), zinc selenide target(ZnSe), aluminum nitride target(AlN), silicon nitride target(SiN), boron nitride target(BN), titanium nitride target(TiN), silicon carbide target(SiC), lithium niobate target(LiNbO3), praseodymium titanate target(PrTiO3), barium titanate target(BaTiO3), lanthanum titanate target(LaTiO3), and so on.
Note: The ceramic target produced in CNM adopts the most advanced ceramic production technology_inert gas protection hot isostatic pressing sintering technology, the relative density is grater than 95-99%. In addition, CNM could provide with the metalizing process of the target and unbounded services.
High purity alloy sputtering target: Nickel-vanadium alloy target(Ni-V), nickel-chromium target(Ni-Cr), titanium-aluminum alloy target(Ti-Al), silicon-aluminum alloy target(Si-Al), copper-indium alloy target(Cu-In), copper-gallium alloy target(Cu-Ga), copper-indium-gallium alloy target(Cu-In-Ga), copper-indium-gallium-selenium alloy target(Cu-In-Ga-Se), stainless steel target, zinc-aluminum alloy target(Zn-Al), tungsten-titanium alloy target(W-Ti), iron-cobalt alloy target(Fe-Co), etc.
Note: CNM product high purity alloy sputtering target: Tiny grain size number (150-60um), high relative density (99-99.9%), high purity (99.9-99.999%).
In addition, CNM provides with the metalizing process of the target materials and unbounded services.
Located in Zhongguancun Science and Technology Park, China New Metal Materials Technology Co., Ltd (hereinafter referred to as CNM), is one of Chinese Nonferrous Metal Industry company specializing in research and develop of new materials. As the initiator of leading enterprises in the industry, CNM integrates many R & D institution and universities superior resources, absorbs domestic and international modern and scientific management experience. Rich in talents and funds, and has passed ISO9001-2008 Quality System Certification and ISO14001 Environment System Certification, owns independent import and export rights.
CNM has been blessed with advantages in R & D of all kinds of metal material, coating material, sputtering target material, functional alloy material and applied technology. Based on large technical power, CNM has developed many series of new materials, and about one hundred kinds of product brands have been applied widely in such industries like aviation and space, military project, infotronics, vacuum coating, magnetron sputtering, metallurgy, functional material, biological medicine and new energy. Now CNM has multiple production lines of coating material, sputtering target, metal material and high purity alloy, etc., with advanced production equipments and perfect craft.
At present our customers are wide spread in more than ten countries and districts like U. S., Europe, Japan, Korea, Taiwan and Hongkong in China, covering over six hundred units including some famous enterprises and institutions of domestic and foreign military research and listed company.
CNM has under it division departments of coating material Sputtering target, metal powder and alloy materials. Warmly welcoming new and old customers to inquire. In adherence to the principle of Integrity-first and Technology-based, our company is deeply committed to build ourselves into an aircraft carrier in new metal material industry.
