Magnetron Sputtering Coating System, PVD Vacuum Sputtering Equipment

Product Specifications

Prod Model:	JTL-0910, JTL-1110
Markets:	North America,South America,Eastern Europe,Southeast Asia,Africa,Oceania,Mid East,Eastern Asia,Western Europe
Name:	Magnetron Sputtering Coating System
Type 1:	Mf Magnetron Sputtering Coating Machine
Coating Technology:	Magnetron Sputtering+Arc Ion Coating
Coating Material:	Stainless Steel, Metal Alloy, Ceramic
Coating Film:	Tin, Tic, Ticn, Tialn, Crn, Cu, Au etc.
Coating Color:	Silver, Golden, Black, Rose Gold, Bronze, Coffee
Application:	Jewelry, Watch, Mobile Phone Shell etc.
Chamber Size:	1100mm*1000mm, 1350mm*1200mm
Control Mode:	Automatic PLC Touch Screen Control
Brand:	Hcvac-Huicheng Vacuum
Coating:	Vacuum Coating
Type:	Magnetron Sputtering Coating System
Substrate:	Magnetron Sputtering Coating System

Product Description

Magnetron sputtering coating system, PVD vacuum sputtering equipment


Magnetron Sputtering


What is magnetron sputtering technology?
Magnetron sputtering is another form of PVD coating technology.

Plasma coating
Magnetron sputtering is a plasma coating process whereby sputtering material is ejected due to bombardment of ions to the target surface. The vacuum chamber of the PVD coating machine is filled with an inert gas, such as argon. By applying a high voltage, a glow discharge is created, resulting in acceleration of ions to the target surface and a plasma coating. The argon-ions will eject sputtering materials from the target surface (sputtering), resulting in a sputtered coating layer on the products in front of the target.

Reactive sputtering
Often an additional gas such as nitrogen or acetylene is used, which will react with the ejected material (reactive sputtering). A wide range of sputtered coatings is achievable with this PVD coating technique. Magnetron sputtering technology is very advantageous for decretive coating (e. G. Ti, Cr, Zr and Carbon Nitrides), because of its smooth nature. The same advantage makes magnetron sputtering widely used for tribological coating in automotive markets (e. G. CrN, Cr2N and various combinations with DLC coating - Diamond Like Carbon coating).

Magnetic fields
Magnetron sputtering is somewhat different from general sputtering technology. The difference is that magnetron sputtering technology uses magnetic fields to keep the plasma in front of the target, intensifying the bombardment of ions. A highly dense plasma is the result of this PVD coating technology.

Magnetron sputtering technology is characterized by:
A water-cooled target, so little radiation heat is generated
Almost any metallic target material can be sputtered without decomposition
Non-conductive materials can be sputtered by using radio frequency (RF)
Or medium frequency (MF) power
Oxide coatings can be sputtered (reactive sputtering)
Excellent layer uniformity
Very smooth sputtered coatings (no droplets)
Cathodes (of up to 2 meter long) can be put in any position, therefore high
Flexibility of sputtering equipment design

Huicheng manufactures and supplies all kinds of PVD vacuum coating machines. Now it is a market leader in the high-vacuum treatment field with customers from all around the world. Huicheng produces a complete range of machinery, offering different types of processes: High vacuum evaporation, multi-arc, DC sputtering, MF magnetron sputtering, continuous magnetron sputtering line etc.



Applied industries:



Surface vacuum coating for watch&clock, jewelries, tools, plastic, stainless steel sheet etc.


HCVAC can help you to enter the PVD coating easily by our vacuum coating machine and full range service. We will provide with most suitable technology according to your requirements.

We will make the special coating solution for each customer; Combine the full set production technics to meet your requirements, to ensure high efficiency of production.


Contact: Lillian Yang

Mobile: 0086-13825720037

Mode Dimension	JT-1214	JT-1416	JT-1618	JT-1820
	1200*1400mm	1400*1600mm	1600*1800mm	1800*2000mm
Film Type	Semitransparent film, non-conducting film, gold, silver, red, blue, green, purple, seven color, etc.
Power source Type	Thermal evaporation power, ion bombard power, RF power
Vacuum chamber structure	Vertical double/single door, horizontal single door, pump system postposition
Ultimate vacuum	8.0*10 -4 Pa
Vacuum system	Diffusion pump +Roots pump +Mechanical pump +Holding pump
Pump time	Pump from atmosphere to 5.0*10 -2 ,Less than or equal to 6 minutes
Workpiece motion mode	Public rotation/Frequency control
Control mode	Manual/Automatic all-in-one mode, Touching screen+PLC
Remark	We can design the dimension of the vacuum chamber according to customer's demand.